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Influence of Zn doping profiles on excitation dependence of photoluminescence intensity in InGaAsP heterostructures

机译:Zn掺杂分布对InGaAsP异质结构中光致发光强度激发依赖性的影响

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摘要

It is known that the Zn doping profile in strained multi-quantum-well (MQW) InGaAsP lasers strongly affects the electro-optical characteristics of these devices and their temperature sensitivity. A systematic investigation of the excitation dependence of the active layer photoluminescence (PL) intensity from compressively strained InGaAsP MQW pin laser material with different Zn doping profiles is described. When the pn junction lies within the active region, the excitation dependence of the PL intensity is superlinear at low excitation and linear at higher excitation. As the Zn profile is set back from the heterointerface creating a displaced pn junction from the active region, the excitation dependence is superlinear and linear at 300 K but becomes linear for all excitation powers at 77 K. The implications of these observations are discussed.
机译:众所周知,应变多量子阱(MQW)InGaAsP激光器中的Zn掺杂分布会严重影响这些器件的电光特性及其温度敏感性。描述了来自具有不同Zn掺杂分布的压缩应变InGaAsP MQW pin激光材料对有源层光致发光(PL)强度的激发依赖性的系统研究。当pn结位于有源区内时,PL强度的激发依赖性在低激发下是超线性的,而在较高激发下是线性的。由于Zn轮廓从异质界面向后倾斜,从而从有源区产生了位移的pn结,因此激发依赖性在300 K时是超线性和线性的,但在77 K时对于所有激发功率都变为线性。讨论了这些发现的含义。

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